International Writers’ Workshop (IWW) Hong Kong Baptist University
A publicly-funded university that prioritizes Creative Media and Practice, HKBU is the only university in Hong Kong with all the following research and teaching areas: Creative Writing, Film and Screen Studies, Literary Studies, Music, Translation Theory and Practice, and Visual Arts. One of the few residency programmes for writers in Asia, IWW remains a long-standing part of HKBU’s
commitment to the literary arts.
Founded in 2004, the International Writers’ Workshop (IWW) at Hong Kong Baptist University has hosted over 130 writers from more than 55 countries. We invite applications from interested writers to join the 2024 Writers-in-Residence Programme from 26 February to 24 March 2024. They look forward to celebrating IWW’s 20th anniversary in 2024, and the programme will culminate in the IWW Literary Festival with the theme of “Origins & Futures.”
Applicants are encouraged, but not required, to address how their work connects to our theme.
Eligibility:
- Writers must have at least one published book;
- Currently reside outside of Hong Kong;
- Have a functional command of English or Chinese (Mandarin or Cantonese).
Participate in the Literary Festival during the final week. Writers are encouraged to share a
piece of writing in conversation with the Literary Festival’s theme.
Application guidelines:
Application Requirements:
- A 1-page, single-spaced Artist’s Statement in English or Chinese describing your work and
your writing goals for the IWW Writers-in-Residence Programme. If your statement is
composed in Chinese, please provide a 1-paragraph summary in English; - 12-15 pages of recent work, such as creative nonfiction, digital writing, drama, fiction,
graphic forms, libretti, or poetry. Please provide an English or a Chinese translation of your
work if your original work is not in English or Chinese; - A CV or resume;
- Contact information, including the e-mail addresses, of two referees; and
- All application materials should be in 12-point type with 1-inch margins.
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